Course Catalogue

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-- This course provides an introduction and fabrication process (such as photolithography and electron-beam lithography system) of Micro- and nanotechnology.

-- The technologies contribute to the design, characterization, manufacture and production, systems and devices by controlling size at the nanometre scale that are very small in size (cheaper, lighter and faster devices).

-- The big contribution of Moore's law in scaling process, which states that the number of transistors on a microchip doubles about every two years.

-- This course also describes about mask manufacturing, CAD design, introducing microscopies, cleanrooms, cleanliness and cleanroom safety protocols, different instruments in cleanroom, familiar with chemical solvents etc., preparing devices like PN junction diode, bipolar transistor (PNP or NPN).

The course will be timetabled in blocks

Mandatory Entry Requirements

None

Recommended Entry Requirements

None

None.

None.

75% final Examination

25% Writing experimental report based on CAD design (such as p-n junction diode, bipolar transistors etc. ), Preparing devices using Photolithography (PL) process including experimental principle, process, and device measurement result and analysis.

Reassessments are normally available for all courses, except those which contribute to the Honours classification. For non Honours courses, students are offered reassessment in all or any of the components of assessment if the satisfactory (threshold) grade for the overall course is not achieved at the first attempt. This is normally grade D3 for undergraduate students and grade C3 for postgraduate students. Exceptionally it may not be possible to offer reassessment of some coursework items, in which case the mark achieved at the first attempt will be counted towards the final course grade. Any such exceptions for this course are described below. 

Due to the nature of the coursework and sequencing of courses, it is not possible to reassess coursework.

The initial grade on coursework will be used when calculating the resit grade.

This course aims to:

■ introduce students to the historical development and present importance of micro- and nano-fabrication technologies;

■ apply and evaluate a clear qualitative, quantitative and practical understanding of the key industrial processes used in micro- and nano-fabrication, and the physical principles underpinning these processes;

■ develop students' abilities to predict the outcomes of fabrication processes in the creation of practical microelectronic devices, and then measure, analyse and optimise fabrication flows.

■ create or make design or pattern of mask using computer-aided design (CAD) systems in Photolithography. Masks are typically made from glass covered with chromium or iron oxide.

By the end of this course students will be able to:

■ apply and explain the physical and chemical processes underpinning key fabrication techniques. (including lithography, oxidation, epitaxy, chemical mechanical polishing, metallization, diffusion, ion implantation, dry etching);

■ Contrast optical and other lithographic systems, illustrating the use of positive and negative resists;

■ Design masks for lithography, using standard CAD tools;

■ calculate processing parameters for oxidation, epitaxy, diffusion, implantation and etch, to predict the results of processes analytically;

■ diagnose processing problems from micrographs and electrical measurements, and present conclusions effectively to experienced practitioners;

■ apply the methods of dry-etching and wet-etching; Explain the principles of design of experiments in optimizing fabrication processes; 

■ understand aspects of health and safety associated with cleanroom fabrication and economic, environmental and social impacts of micro- and nano-fabrication in the present and near future, based on sound understanding of technical practicalities.

■ operate the different types of microscopes, such as SEM, AFM, TEM, and STM

Students must attend the degree examination and submit at least 75% by weight of the other components of the course's summative assessment.

Students should attend at least 75% of the timetabled classes of the course.

Students must attend to laboratory classes at given specific timetable.

Note that these are minimum requirements: good students will achieve far higher participation/submission rates. Any student who misses an assessment or a significant number of classes because of illness or other good cause should report this by completing a MyCampus absence report.